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A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: * Synthesis and Preparation of Oxide Ultrathin Films * Characterization Tools of Oxide Ultrathin Films * Ordered Oxide Nanostructures on Metal Surfaces * Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit * Silica and High-K Dielectrics Thin Films in Microelectronics * Oxide Passive Films and Corrosion Protection * Oxide Films as Catalytic Materials and as Models of Real Catalysts * Oxide Films in Spintronics * Oxide Ultrathin Films in Solid Oxide Fuel Cells * Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials * Oxide Ultrathin Films in Sensor Applications * Ferroelectricity in Ultrathin Film Capacitors * Titania Thin Films in Biocompatible Materials and Medical Implants * Oxide Nanowires for New Chemical Sensor Devices
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Seitenzahl: 731
Veröffentlichungsjahr: 2012
Contents
Preface
List of Contributors
Chapter 1: Synthesis and Preparation of Oxide Ultrathin Films
1.1 Introduction
1.2 Basic Aspects of Fabrication
1.3 Physical Methods
1.4 Chemical Methods
1.5 Oxide Nanosheets and Buried Layers
1.6 Conclusions and Perspectives
Chapter 2: Characterization Tools of Ultrathin Oxide Films
2.1 Introduction
2.2 Structure Determination Techniques
2.3 Spectroscopic Techniques
2.4 Summary
Chapter 3: Ordered Oxide Nanostructures on Metal Surfaces
3.1 Introduction
3.2 Fabrication of Oxide Nanostructures
3.3 Novel Structure Concepts
3.4 Dimensionality Aspects: from Two- to One- to Zero-Dimensional Structures
3.5 Transition from Two- to Three-Dimensional Structures: Growth of Bulk Structures out of Interfacial Layers
3.6 Synopsis
Acknowledgment
Chapter 4: Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit
4.1 Introduction
4.2 Evolution of Band Gap with Film Thickness
4.3 Electronic Transport through Oxide Ultrathin Films
4.4 Work Function Changes Induced by Oxide Films
4.5 Nanoporosity: Oxide Films as Molecular and Atomic Sieves
4.6 Flexibility of Oxide Thin Films and Polaronic Distortion
4.7 Conclusions
Acknowledgments
Chapter 5: Silica and High-k Dielectric Thin Films in Microelectronics
5.1 Introduction
5.2 Electrical Characterization of High-k Dielectrics on Silicon
5.3 Theoretical Modeling of Gate Dielectric Films
5.4 Models of the Structure and Properties of HfO2 Gate Dielectric Films
5.5 Polycrystalline Gate Oxide Films
5.6 Conclusions and Outlook
Acknowledgments
Chapter 6: Oxide Passive Films and Corrosion Protection
6.1 Introduction
6.2 Electrochemical Fundamentals of Passivation of Metals
6.3 Chemical Composition, Chemical States, and Thickness of Passive Films on Metals and Alloys
6.4 Two-Dimensional Oxide Passive Films on Metals
6.5 Growth and Nanostructure of Three-Dimensional Ultrathin Oxide Films
6.6 Corrosion Modeling by DFT
6.7 Conclusion
Chapter 7: Oxide Films as Catalytic Materials and Models of Real Catalysts
7.1 Introduction
7.2 Oxide Thin Films Grown as Supports
7.3 Systems to Model Real Catalysts
7.4 Ultrathin-Film Catalysts
7.5 Synopsis
Acknowledgments
Chapter 8: Oxide Films in Spintronics
8.1 Introduction
8.2 Historical Notes
8.3 Half-Metallic Manganites: the Case of LSMO
8.4 Electric Control of Magnetization in Oxide Heterostructures
8.5 Conclusions and Perspectives
Acknowledgments
Chapter 9: Oxide Ultrathin Films for Solid Oxide Fuel Cells
9.1 Overview of Solid Oxide Fuel Cell Technology
9.2 Preparation of Oxide Ion Conductor Thin Films
9.3 Nano Size Effects on Oxide Ion Conductor Films
9.4 Power Generating Property of SOFCs using LaGaO3 Thin Films
9.5 Development of μ-SOFCs
9.6 Concluding Remarks
Chapter 10: Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials
10.1 Introduction
10.2 Transparent Infrared Reflectors and Transparent Electrical Conductors
10.3 Thermochromics
10.4 Electrochromics
10.5 Summary and Concluding Remarks
Chapter 11: Oxide Ultrathin Films in Sensor Applications
11.1 Introduction
11.2 Sensor Applications
11.3 SnO2-Based Gas Sensors
11.4 Conclusion
Chapter 12: Ferroelectricity in Ultrathin-Film Capacitors
12.1 Introduction
12.2 Ferroelectricity: Basic Definitions
12.3 Theoretical Methods for the Study of Bulk Ferroelectric Materials
12.4 Modeling Ferroelectricity in Oxides
12.5 Theory of Ferroelectric Thin Films
12.6 Polarization Domains and Domain Walls
12.7 Artificially Layered Ferroelectrics
12.8 Conclusion and Perspectives
Acknowledgments
Chapter 13: Titania Thin Films in Biocompatible Metals and Medical Implants
13.1 The Advent of Titanium-Based Materials
13.2 Biologically Relevant Physicochemical Properties of Native Titania Thin Films
13.3 Strategies for Modification of the Surface Oxide Layer
13.4 Biological Surface Science
13.5 Biological Response to Surface Oxide Layers
13.6 Slow Release Capacity of Nanoporous Titanium Oxide Layers
13.7 Conclusion and Perspectives
Acknowledgments
Chapter 14: Oxide Nanowires for New Chemical Sensor Devices
14.1 Outline
14.2 Introduction
14.3 Synthesis
14.4 Integration
14.5 Metal Oxide Chemical Sensors
14.6 Conductometric Sensors
14.7 Optical Sensors
Index
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The Editors
Prof. Gianfranco Pacchioni
Università Milano Bicocca
Dipartimento di Scienza dei Materiali
via R. Cozzi 53
20125 Milano
Italy
Prof. Sergio Valeri
Università di Modena e Reggio Emilia
Dipartimento di Fisica
Via G. Campi 213 /A
41100 Modena
Italy
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Preface
Oxide materials in bulk phase offer a great variety of behaviors. Most oxides are insulators or semiconductors, but there are also cases of metallic and even superconducting oxides; some are chemically inert and are therefore well suited for facing aggressive chemical environments, other are moderately reactive which makes them ideal for specific catalytic processes; oxides also exhibit a great variety of optical properties, from transparency to electrochromism; and so on. The richness of behaviors is due to the complex nature of the metal-oxygen bond, to the fact that oxides can exist in various compositions, and finally to the possibility to modify the properties by doping or by slightly changing the stoichiometry of the material. Recent advances in the growth under controlled conditions of ultrathin oxide films on a support (metals, semiconductors, other oxides) has paved the way towards nanostructures with special size, shape, composition and properties. By preparing oxides at the nanoscale, one can play around with a new parameter, the film thickness, to tune material properties on demand.
A precise definition of the concept of “ultrathin film” is not easy, as there is no simple way to identify the boundaries of this category from the broad area of thin films. It is clear that when the film thickness is below some characteristic length scale of the material, as the mean-free path of electrons, the spin diffusion length, the electron-hole mean recombination length, the magnetic domain wall widths, and so on we are in a special regime where new phenomena start to occur. However, from a purely practical point of view, we tend to classify as ultrathin films whose with thickness below 100 nm, a regime where structures and properties start to differ from the corresponding bulk counterparts. Some of the technologies discussed in this book already make use of such ultrathin films, while in other cases one is dealing with slightly thicker, hence more “traditional” structures, and the search for thinner layers is still at the research and development level.
Oxide ultrathin films and nanosheets are integral part of several advanced technologies. Some of these technologies are well established (e.g., oxide films in field-effect transistors or flash memories), and are used since decades. In other cases oxide ultrathin films are essential to confer a specific property to a material (e.g., biocompatibility of metal implants in medicine or protection of metals from corrosion by formation of passive layers); in other cases, it is only recently that the importance of oxide ultrathin films has been recognized (e.g., the formation of active oxide layers in oxidative catalysis by metals). Other systems and devices of new generation are especially designed to exploit the reduced thickness of oxide films in order to give rise to new phenomena or improved performances (e.g., tunneling magnetoresistance sensors, special coatings for energy saving, ferroelectric ultrathin film capacitors, solid oxide fuel cells).
The applications, the preparation and characterization methods are so diverse that often communities developing and using oxide ultrathin films are not communicating to each other. One motivation of this book is thus to bring together examples and contributions coming from fields as diverse as surface chemistry, magnetism, energy materials, biomaterials, solid state physics, catalysis, microelectronics, sensors, and so on, all related to the exploitation of the peculiar properties of ultrathin oxide films.
With this book we plan to give an overview of the present state of the art by addressing some fundamental aspects of the preparation and physico-chemical characterization of these systems, with particular attention to the new properties that they can exhibit. But aim of the book is also to illustrate direct applications and technologies where the use of ultrathin oxide films is either mature or is very promising in terms of potential outcomes.
There is little doubt that these systems are going to play an increasingly important role in the future. A deeper understanding of their nature, a better control of their properties, a perspective view of their potentialities are all aspects which are essential in order to foster research in this exciting field. This is also the main motivation of this book.
Gianfranco Pacchioni and Sergio Valeri
List of Contributors
Pablo Aguado-Puente
Departamento de Ciencias de la Tierra
y Fisica de la Materia Condensada
Universidad de Cantabria, Cantabria
Campus Internacional
Avda. de los Castros s/n
E-39005 Santander
Spain
Stefania Benedetti
S3 Istituto Nanoscienze CNR
Modena
Italy
Gennadi Bersuker
SEMATECH
Austin
TX 78741
USA
Riccardo Bertacco
Politecnico di Milano
LNESS, Dipartimento di Fisica
via Anzani 42
Como
20100
Italy
Elise Brunet
AIT Austrian Institute of Technology
GmbH
Health & Environment Department,
Nano Systems
Donau-City-Straße 1
1220
Vienna
Austria
Franco Ciccacci
Politecnico di Milano
LNESS, Dipartimento di Fisica
piazza L. da Vinci 32
20133
Milano
Italy
Elisabetta Comini
University of Brescia
Department of Chemistry and Physics
Via Valotti 9
25133
Brescia
Italy
Hans-Joachim Freund
Fritz-Haber-Institut der Max-Planck-Gesellschaft
Faradayweg 4-6
D-14195
Berlin
Germany
Philippe Ghosez
Physique Théorique des Matériaux
Université de Liège
Allée du 6 Août 17 (B5)
B-4000 Sart Tilman
Belgium
Livia Giordano
Università di Milano-Bicocca
Dipartimento di Scienza dei Materiali
via Cozzi 53
20125
Milano
Italy
Claes-Göran Granqvist
Uppsala University
Department of Engineering Sciences,
Ångström Laboratory
PO Box 534
SE-751 21
Uppsala
Sweden
David C. Grinter
University College London
London Centre for Nanotechnology and Department of Chemistry
WC1H 0AJ
UK
London
Tatsumi Ishihara
Kyushu University
Department of Applied Chemistry
Motooka 744
819-0395
Nishi-ku, Fukuoka
Japan
Javier Junquera
Departamento de Ciencias de la Tierra
y Fisica de la Materia Condensada
Universidad de Cantabria, Cantabria
Campus Internacional
Avda. de los Castros s/n
E-39005 Santander
Spain
Anton Köck
AIT Austrian Institute of Technology
GmbH
Health & Environment Department,
Nano Systems
Donau-City-Straße 1
1220
Vienna
Austria
Céline Lichtensteiger
DPMC - Université de Genève
24 Quai Ernest Ansermet
CH-1211 Genève 4
Switzerland
Philippe Marcus
Ecole Nationale Supérieure de Chimie
de Paris
Laboratoire de Physico-Chimie des
Surfaces, Chimie ParisTech – CNRS
(UMR 7045)
11 rue Pierre et Marie Curie
75005
Paris
France
Vincent Maurice
Ecole Nationale Supérieure de Chimie
de Paris
Laboratoire de Physico-Chimie des
Surfaces, Chimie ParisTech – CNRS
(UMR 7045)
11 rue Pierre et Marie Curie
75005
Paris
France
Keith McKenna
Tohoku University
WPI-Advanced Institute for Materials
Research
2-1-1, Katahira, Aoba-ku
980-8577
Sendai
Japan
and
University College London
Department of Physics and Astronomy
Gower Street
WC1E 6BT
London
UK
Giorgio Mutinati
AIT Austrian Institute of Technology
GmbH
Health & Environment Department,
Nano Systems
Donau-City-Straße 1
1220
Vienna
Austria
Antonio Nanci
Université de Montréal
Laboratory for the Study of Calcified
Tissues and Biomaterials
H3C 3J7
Montréal, QC
Canada
Falko P. Netzer
Karl-Franzens University Graz
Surface and Interface Physics
A-8010
Graz
Austria
Gianfranco Pacchioni
Università di Milano-Bicocca
Dipartimento di Scienza dei Materiali
via Cozzi 53
20125
Milano
Italy
Giorgio Sberveglieri
University of Brescia
Department of Chemistry and Physics
Via Valotti 9
25133
Brescia
Italy
Alexander Shluger
Tohoku University
WPI-Advanced Institute for Materials Research
2-1-1, Katahira, Aoba-ku
980-8577
Sendai
Japan
and
University College London
Department of Physics and Astronomy
Gower Street
WC1E 6BT
London
UK
Stephan Steinhauer
AIT Austrian Institute of Technology
GmbH
Health & Environment Department,
Nano Systems
Donau-City-Straße 1
1220
Vienna
Austria
Massimiliano Stengel
Institut de Ciènca de Materials de
Barcelona (ICMAB-CSIC)Campus UAB
E-08193 BellaterraSpain
Svetlozar Surnev
Karl-Franzens University Graz
Surface and Interface Physics
A-8010
Graz
Austria
Geoff Thornton
University College London
London Centre for Nanotechnology and Department of Chemistry
WC1H 0AJ
London
UK
Jean-Marc Triscone
DPMC - Université de Genève
24 Quai Ernest Ansermet
CH-1211 Genève 4
Switzerland
Sergio Valeri
Università di Modena e Reggio Emilia
Dipartimento di Fisica
Modena
Italy
and
S3 Istituto Nanoscienze CNR
Modena
Italy
Fabio Variola
University of Ottawa
Department of Mechanical Engineering
K1N 6N5
Ottawa, ON
Canada
Alberto Vomiero
CNR IDASC Sensor Laboratory
Via Valotti 9
25133
Brescia
Italy
Pavlo Zubko
DPMC - Université de Genève
24 Quai Ernest Ansermet
CH-1211 Genève 4
Switzerland
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