Introduction to Plasma Technology E-Book

John Ernest Harry

• Herausgeber: Wiley-VCH
• Kategorie: Wissenschaft und neue Technologien
• Sprache: Englisch

Seitenzahl: 328

Veröffentlichungsjahr: 2013

Beschreibung

Written by a university lecturer with more than forty years experience in plasma technology, this book adopts a didactic approach in its coverage of the theory, engineering and applications of technological plasmas.
The theory is developed in a unified way to enable brevity and clarity, providing readers with the necessary background to assess the factors that affect the behavior of plasmas under different operating conditions. The major part of the book is devoted to the applications of plasma technology and their accompanying engineering aspects, classified by the various pressure and density regimes at which plasmas can be produced. Two chapters on plasma power supplies round off the book.
With its broad range of topics, from low to high pressure plasmas, from characterization to modeling, and from materials to components, this is suitable for advanced undergraduates, postgraduates and professionals in the field.

Leseprobe

Contents

Cover

Half Title page

Related Titles

Title page

Copyright page

Preface

Symbols, Constants and Electronic Symbols

Chapter 1: Plasma, an Overview

1.1 Introduction

1.2 Plasma

1.3 Classical Models

1.4 Plasma Resonance

1.5 The Defining Characteristics of a Plasma

References

Further Reading

Chapter 2: Elastic and Inelastic Collision Processes in Weakly Ionized Gases

2.1 Introduction

2.2 The Drift Velocity

2.3 Inelastic Collision Processes

References

Chapter 3: The Interaction of Electromagnetic Fields with Plasmas

3.1 Introduction

3.2 The Behaviour of Plasmas at DC and Low Frequencies in the Near Field

3.3 Behaviour of Charged Particles in Magnetic Fields (Magnetized Plasmas)

3.4 Initiation of an Electrical Discharge or Plasma

3.5 Similarity Conditions

References

Further Reading

Chapter 4: Coupling Processes

4.1 Introduction

4.2 Direct Coupling

4.3 Indirect Coupling

References

Further Reading

Chapter 5: Applications of Nonequilibrium Cold Low-pressure Discharges and Plasmas

5.1 Introduction

5.2 Plasma Processes Used in Electronics Fabrication

5.3 Low-Pressure Electric Discharge and Plasma Lamps

5.4 Gas Lasers

5.5 Free Electron and Ion Beams

5.6 Glow Discharge Surface Treatment

5.7 Propulsion in Space

References

Further Reading

Chapter 6: Nonequilibrium Atmospheric Pressure Discharges and Plasmas

6.1 Introduction

6.2 Atmospheric Pressure Discharges

6.3 Electrostatic Charging Processes

6.4 Dielectric Barrier Discharges

6.5 Plasma Display Panels

6.6 Manufacture of Ozone

6.7 Surface Treatment Using Barrier Discharges

6.8 Mercury-Free Lamps

6.9 Partial Discharges

6.10 Surface Discharges

Further Reading

Chapter 7: Plasmas in Charge and Thermal Equilibrium; Arc Processes

7.1 Introduction

7.2 Arc Welding

7.3 Electric Arc Melting

7.4 Arc Gas Heaters

7.5 High-Pressure Discharge Lamps

7.6 Ion Lasers

7.7 Arc Interrupters

7.8 Magnetoplasmadynamic Power Generation

7.9 Generation of Electricity by Nuclear Fusion

7.10 Natural Phenomena

Further Reading

Chapter 8: Diagnostic Methods

8.1 Introduction

8.2 Neutral Particle Density Measurement

8.3 Probes and Sensors

8.4 Optical Spectroscopy

8.5 Interferometry

8.6 Mass Spectrometry

8.7 Electrical Measurements

Further Reading

Chapter 9: Matching, Resonance and Stability

9.1 Introduction

9.2 The Plasma Characteristic

9.3 Stabilizing Methods

9.4 Effect of Frequency

9.5 Interaction between the Plasma and Power Supply Time Constants

9.6 Matching

9.7 Resonance

9.8 Parasitic Inductance and Capacitance

Further Reading

Chapter 10: Plasma Power Supplies

10.1 Introduction

10.2 Transformers and Inductors

10.3 Rectification

10.4 Semiconductor Power Supplies

10.5 Electronic Valve Oscillators

10.6 Microwave Power Supplies

10.7 Pulsed Power Supplies

10.8 Ignition Power Supplies

10.9 Electromagnetic Interference

Further Reading

Index

John Harry

Introduction to Plasma Technology

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The Author

Dr. John HarryHighviewKnossington RoadBraunstonOakhamRutland LE15 8QXUnited Kingdom

All books published by Wiley-VCH are carefully produced. Nevertheless, authors, editors, and publisher do not warrant the information contained in these books, including this book, to be free of errors. Readers are advised to keep in mind that statements, data, illustrations, procedural details or other items may inadvertently be inaccurate.

Library of Congress Card No.: applied for

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Bibliographic information published by the Deutsche NationalbibliothekThe Deutsche Nationalbibliothek lists this publication in the Deutsche Nationalbibliografie; detailed bibliographic data are available on the Internet at <http://dnb.d-nb.de>.

© 2010 WILEY-VCH Verlag & Co. KGaA, Boschstr. 12, 69469 Weinheim, Germany

All rights reserved (including those of translation into other languages). No part of this book may be reproduced in any form – by photoprinting, microfilm, or any other means – nor transmitted or translated into a machine language without written permission from the publishers. Registered names, trademarks, etc. used in this book, even when not specifically marked as such, are not to be considered unprotected by law.

Cover   Adam Design, Weinheim

ISBN: 978-3-527-32763-8

Preface

Plasma plays an ever increasing role in industrial, commercial and domestic environments and also space and fusion research. The evolution of new applications of plasmas continues to accelerate at an increasing rate. Applications in medicine, textile treatment, solar cells, electrohydraulic water treatment, paper, packaging and corrosion protection are among many.

Early books have treated the topic as a whole and it was within the curriculum of many undergraduate courses. However, since the replacement of the electronic valve by semiconductors and with the increasing complexity of the subject, books have become more specialized and application orientated. This has impeded an introduction to plasma technology and limited knowledge of plasma processes and applications and opportunities for cross-fertilization have been missed. Those in the field are often unaware of the different methods for producing plasmas and applying plasma technology outside their own area of expertise. Indeed, the apparent complexity of the subject has restricted practitioners largely to physicists and chemists at graduate or postgraduate level and the subject is regarded as opaque.

A fundamental challenge is the need to couple energy into a plasma. When plasmas were limited to DC and low-frequency AC this was relatively straightforward. Coupling energy into a plasma, particularly at high frequencies and low gas pressures, has become a critical area. Few books today give power supplies any more than cursory attention, when in fact energization of the plasma is at the core of the process and the selection, matching and correct operation of the power supply are critical to the success of research or industrial processes.

This book not only serves to fill the gaps that existing publications leave, but also develops an understanding of both the plasma and its interaction with the supply, which is essential both in research and to optimize applications. Recent advances in the use of semiconductors to generate power at high frequencies and the development of high-speed switching methods have enabled complex high-frequency electronic supplies to be developed, opening up many new areas of application such as in medicine and textile treatment. This book addresses the problem of design and selection, matching and optimizing the power supply for a given process.

The objective of this book is to make the subject accessible, and this is achieved by providing a concise, unified introduction to the subject over the full range of plasma operation at a level appropriate to professional engineers or scientists, final-year undergraduates in a technical discipline and postgraduates entering the field and as a reference text.

The philosophy of the book is to treat the subject in the simplest of terms so that a clear understanding is achieved using simple models without resorting to complex mathematics. Varying degrees of complexity are developed by superimposing the different processes in the same way as superposition is used to solve problems in electric circuits.

Finally, I would like to thank David Hoare for his patient help, advice and insight in helping me with writing the book, Ben Thompson for his painstaking creation of the diagrams and my wife Suzanne for her encouragement and patience and willing assistance with proofreading.

Oakham, Rutland, UK

March 2010

John Harry

Symbols, Constants and Electronic Symbols

Symbols

aaccelerationaradiusAareaBmagnetic fieldcvelocity of lightddistancedsthickness of plasma sheathDdiffusion coefficientDDebye lengtheelectron chargeEelectric fieldf(w)energy distribution functionf(u)velocity distribution functionfcecritical electron frequencyfcicritical ion frequencyhPlanck’s constantiinstantaneous currentIcurrentJcurrent densitykBBoltzmann’s constantLcharacteristic reactor dimensionm, Mmass of particlenparticle number densitynDnumber of particles in a Debye sphereppressurePpowerqelectrical chargerradiussdistancettimeTtemperatureu, vvelocityvinstantaneous voltageVelectrical potential, voltageVolvolumeWenergyαdegree of ionization0permittivity of free spacerrelative pemittivityμmobilityμrefractive indexωangular frequencyτresidence timeδskin depthEenergyφphase angleφwwork function (eV)λwavelengthλemean free path electronλimean free path ionλDDebye lengthμ0permeability of free spaceμrrelative permeabilityνcollision frequencyνeelectron collision frequencyνiion collision frequencyθangleρelectrical resistivityσelectrical conductivityηviscosityτperiod of frequencyωangular frequencyωggyro frequencyωeelectron angular frequencyωiion angular frequencyωccyclotron frequencyωpeelectron plasma angular resonant frequencyωpiion plasma angular resonant frequencyωssupply angular frequency

Useful Constants

Charge of electron, e, 1.6 ×10−19 C

Avogadro’s number, nA, 6.02 × 1023 particles mol−1 at NTP (normal temperature and pressure, 20 °C and 760 Torr)

Boltzmann’s constant, k = R0/nA, 1.38 × 10−23 J K1

Electronvolt, eV, 1.6 × 10−19 J

Loschmidt’s number, nL, 2.69 × 1025 particles m−3 in a gas at NTP

Mass of electron, me, 9.11 × 10−31 kg

Mass of proton (hydrogen atom), mi, 1.67 × 10−27 kg

Mean free path (nitrogen), λh, 6.63 × 10−8 m at NTP

Permeability of free space μ0, 4π × 10−7 H m−1

Permittivity of free space 0, 8.85 × 10−12 F m−1

Planck’s constant, h, 6.626 × 10−34 J s

Random velocity (nitrogen molecule), ur, 509 m s−1 at NTP

Ratio of mass of proton to mass of electron, 1833

Universal gas constant, R0, 8.31 J K−1 mol−1

Stefan–Boltzmann constant, kb, 5.67 ×10−8 W m−2 K−4

Velocity of light, c0, 3 ×108 m s−1

1 bar = 760 Torr 101 kPa

Pressure Units Conversion

1 bar = 760 Torr = 100 kPa or 105 Pa

1 mbar = 100 Pa

1 Torr = 133 Pa

5 Torr = 665 Pa

1 m Torr = 0.133 Pa

101 kPa = 760 Torr = 1 atm = 105 Pa

1 kPa = 7.52 Torr

100 Pa = 0.752 Torr

1 Pa = 7.52 ×10−3 Torr

1 mPa = 7.52 ×10−6 Torr

Some Useful Plasma Relationships

Electron plasma frequency

Ion plasma frequency

Electron cyclotron or gyro frequency

Ion cyclotron or gyro frequency

Debye length

Free electrons in Debye volume

Velocity of electro-magnetic waves

Velocity of light in free space

Impedance of free space

Phase velocity

Group velocity

Electronic Symbols

air cored transformeramplifiercapacitordiodedischargeearth connectionferrite ring inductorIGBTinductoriron cored transformerMOSFETresistorthyristor

Chapter 1

Plasma, an Overview

1.1 Introduction

This chapter introduces the different areas of plasma, the unique aspects of the subject, definitions, the use of simple ballistic and statistical models and the defining characteristics of plasmas.