122,99 €
* Offers a comprehensive overview of NAND flash memories, with insights into NAND history, technology, challenges, evolutions, and perspectives * Describes new program disturb issues, data retention, power consumption, and possible solutions for the challenges of 3D NAND flash memory * Written by an authority in NAND flash memory technology, with over 25 years' experience
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Seitenzahl: 727
Veröffentlichungsjahr: 2015
IEEE Press445 Hoes LanePiscataway, NJ 08854
IEEE Press Editorial BoardTariq Samad, Editor in Chief
George W. Arnold Vladimir Lumelsky Linda ShaferDmitry Goldgof Pui-In Mak Zidong WangEkram Hossain Jeffrey Nanzer MengChu ZhouMary Lanzerotti Ray Perez George Zobrist
Kenneth Moore, Director of IEEE Book and Information Services (BIS)
Technical Reviewers
Joe E Brewer, PE, Electronic Engineering ConsultantChandra Mouli, Director, R&D Device Technology, Micron Technology Inc, Boise ID, USAGabriel Molas, CEA LETI Minatec, Grenoble, France
SEIICHI ARITOME
Copyright © 2016 by The Institute of Electrical and Electronics Engineers, Inc.
Published by John Wiley & Sons, Inc., Hoboken, New Jersey. All rights reserved Published simultaneously in Canada
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Library of Congress Cataloging-in-Publication Data is available.
ISBN: 978-1-119-13260-8
Foreword
Preface
Acknowledgments
About the Author
1 Introduction
1.1 Background
1.2 Overview
References
2 Principle of NAND Flash Memory
2.1 NAND Flash Device and Architecture
2.2 Cell Operation
2.3 Multilevel Cell (MLC)
References
3 NAND Flash Memory Devices
3.1 Introduction
3.2 LOCOS Cell
3.3 Self-Aligned STI Cell (SA-STI Cell) with FG Wing
3.4 Self-Aligned STI Cell (SA-STI Cell) without FG Wing
3.5 Planar FG Cell
3.6 SideWall Transfer Transistor Cell (SWATT Cell)
3.7 Advanced NAND Flash Device Technologies
References
4 Advanced Operation for Multilevel Cell
4.1 Introduction
4.2 Program Operation for Tight
V
t
Distribution Width
4.3 Page Program Sequence
4.4 TLC (3 Bits/Cell)
4.5 QLC (4 Bits/Cell)
4.6 Three-Level (1.5 bits/cell) NAND flash
4.7 Moving Read Algorithm
References
5 Scaling Challenge of NAND Flash Memory Cells
5.1 Introduction
5.2 Read Window Margin (RWM)
5.3 Floating-Gate Capacitive Coupling Interference
5.4 Program Electron Injection Spread
5.5 Random Telegraph Signal Noise (RTN)
5.6 Cell Structure Challenge
5.7 High-Field Limitation
5.8 A few electron phenomena
5.9 Patterning Limitation
5.10 Variation
5.11 Scaling impact on Data Retention
5.12 Summary
References
6 Reliability of NAND Flash Memory
6.1 Introduction
6.2 Program/Erase Cycling Endurance and Data Retention
6.3 Analysis of Program/Erase Cycling Endurance and Data Retention
6.4 Read Disturb
6.5 Program Disturb
6.6 Erratic Over-Program
6.7 Negative
V
t
shift phenomena
6.8 Summary
References
7 Three-Dimensional NAND Flash Cell
7.1 Background of Three-Dimensional NAND cells
7.2 BiCS (Bit Cost Scalable technology) / P-BiCS (Pipe-shape BiCS)
7.3 TCAT (Terabit Cell Array Transistor)/V-NAND (Vertical-NAND)
7.4 SMArT (Stacked Memory Array Transistor)
7.5 VG-NAND (Vertical Gate NAND Cell)
7.6 Dual Control gate—Surrounding Floating gate Cell (DC-SF cell)
7.7 Advanced DC-SF cell
References
8 Challenges of Three-Dimensional NAND Flash Memory
8.1 Introduction
8.2 Comparison of 3D NAND cells
8.3 Data Retention
8.4 Program Disturb
8.5 Word-Line RC delay
8.6 Cell Current Fluctuation
8.7 Number of Stacked Cells
8.8 Peripheral Circuit Under Cell Array
8.9 Power Consumption
8.10 Future Trend of 3D NAND Flash Memory
References
9 Conclusions
9.1 Discussions and conclusions
9.2 Perspective
References
Index
IEEE Press Series on Microelectronic Systems
EULA
Chapter 1
Table 1.1
Chapter 3
Table 3.1
Table 3.2
Table 3.3
Table 3.4
Table 3.5
Chapter 5
Table 5.1
Chapter 6
Table 6.1
Table 6.2
Chapter 7
Table 7.1
Table 7.2
Table 7.3
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